Broadband perfect absorber based on one ultrathin layer of refractory metal

Journal Article · Thu Jan 01 00:00:00 EST 2015 · Optics Letters

DOI:https://doi.org/10.1364/OL.40.002592· OSTI ID:1392512

Deng, Huixu; Li, Zhigang; Stan, Liliana; Rosenmann, Daniel; Czaplewski, David; Gao, Jie; Yang, Xiaodong

Broadband perfect absorber based on one ultrathin layer of the refractory metal chromium without structure pat- terning is proposed and demonstrated. The ideal permittivity of the metal layer for achieving broadband perfect absorption is derived based on the impedance transformation method. Since the permittivity of the refractory metal chromium matches this ideal permittivity well in the visible and near-infrared range, a silica-chromium-silica three-layer absorber is fabricated to demonstrate the broadband perfect absorption. The experimental results under normal incidence show that the absorption is above 90% over the wavelength range of 0.4–1.4 μm, and the measurements under angled incidence within 400–800 nm prove that the absorber is angle-insensitive and polarization- independent.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES)
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 1392512
• Journal Information: Optics Letters, Vol. 40, Issue 11; ISSN 0146-9592
• Publisher: Optical Society of America (OSA)
• Country of Publication: United States
• Language: English