Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing

Journal Article · Tue Jan 20 00:00:00 EST 2015 · ACS Macro Letters

DOI:https://doi.org/10.1021/mz500705q· OSTI ID:1392088

Hur, Su-Mi; Khaira, Gurdaman S.; Ramírez-Hernández, Abelardo; Müller, Marcus; Nealey, Paul F.; de Pablo, Juan J.

Solvent annealing provides an effective means to control the self-assembly of block copolymer (BCP) thin films. Multiple effects, including swelling, shrinkage, and morphological transitions, act in concert to yield ordered or disordered structures. The current understanding of these processes is limited; by relying on a theoretically informed coarse-grained model of block copolymers, a conceptual framework is presented that permits prediction and rationalization of experimentally observed behaviors. Through proper selection of several process conditions, it is shown that a narrow window of solvent pressures exists over which one can direct a BCP material to form well-ordered, defect-free structures.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 1392088
• Journal Information: ACS Macro Letters, Vol. 4, Issue 1; ISSN 2161-1653
• Publisher: American Chemical Society (ACS)
• Country of Publication: United States
• Language: English