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Title: Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing

Abstract

Solvent annealing provides an effective means to control the self-assembly of block copolymer (BCP) thin films. Multiple effects, including swelling, shrinkage, and morphological transitions, act in concert to yield ordered or disordered structures. The current understanding of these processes is limited; by relying on a theoretically informed coarse-grained model of block copolymers, a conceptual framework is presented that permits prediction and rationalization of experimentally observed behaviors. Through proper selection of several process conditions, it is shown that a narrow window of solvent pressures exists over which one can direct a BCP material to form well-ordered, defect-free structures.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1392088
DOE Contract Number:  
AC02-06CH11357
Resource Type:
Journal Article
Resource Relation:
Journal Name: ACS Macro Letters; Journal Volume: 4; Journal Issue: 1
Country of Publication:
United States
Language:
English

Citation Formats

Hur, Su-Mi, Khaira, Gurdaman S., Ramírez-Hernández, Abelardo, Müller, Marcus, Nealey, Paul F., and de Pablo, Juan J.. Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing. United States: N. p., 2015. Web. doi:10.1021/mz500705q.
Hur, Su-Mi, Khaira, Gurdaman S., Ramírez-Hernández, Abelardo, Müller, Marcus, Nealey, Paul F., & de Pablo, Juan J.. Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing. United States. doi:10.1021/mz500705q.
Hur, Su-Mi, Khaira, Gurdaman S., Ramírez-Hernández, Abelardo, Müller, Marcus, Nealey, Paul F., and de Pablo, Juan J.. Tue . "Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing". United States. doi:10.1021/mz500705q.
@article{osti_1392088,
title = {Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing},
author = {Hur, Su-Mi and Khaira, Gurdaman S. and Ramírez-Hernández, Abelardo and Müller, Marcus and Nealey, Paul F. and de Pablo, Juan J.},
abstractNote = {Solvent annealing provides an effective means to control the self-assembly of block copolymer (BCP) thin films. Multiple effects, including swelling, shrinkage, and morphological transitions, act in concert to yield ordered or disordered structures. The current understanding of these processes is limited; by relying on a theoretically informed coarse-grained model of block copolymers, a conceptual framework is presented that permits prediction and rationalization of experimentally observed behaviors. Through proper selection of several process conditions, it is shown that a narrow window of solvent pressures exists over which one can direct a BCP material to form well-ordered, defect-free structures.},
doi = {10.1021/mz500705q},
journal = {ACS Macro Letters},
number = 1,
volume = 4,
place = {United States},
year = {Tue Jan 20 00:00:00 EST 2015},
month = {Tue Jan 20 00:00:00 EST 2015}
}