Enhanced polymeric lithography resists via sequential infiltration synthesis

Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.; Czaplewski, David A.; Elam, Jeffrey W.; Darling, Seth B.

doi:10.1039/C1JM12461G

Title: Enhanced polymeric lithography resists via sequential infiltration synthesis

Journal Article · Sat Jan 01 00:00:00 EST 2011 · Journal of Materials Chemistry

DOI:https://doi.org/10.1039/C1JM12461G· OSTI ID:1382820

Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.; Czaplewski, David A.; Elam, Jeffrey W.; Darling, Seth B.

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Research Organization:: Energy Frontier Research Centers (EFRC) (United States). Argonne-Northwestern Solar Energy Research Center (ANSER)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

DOE Contract Number:: SC0001059

OSTI ID:: 1382820

Journal Information:: Journal of Materials Chemistry, Vol. 21, Issue 32; Related Information: ANSER partners with Northwestern University (lead); Argonne National Laboratory; University of Chicago; University of Illinois, Urbana-Champaign; Yale University; ISSN 0959-9428

Publisher:: Royal Society of Chemistry

Country of Publication:: United States

Language:: English

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A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates Peng, Qing; Tseng, Yu-Chih; Darling, Seth B. ACS Nano, Vol. 5, Issue 6, p. 4600-4606 https://doi.org/10.1021/nn2003234	journal	May 2011
Surface and sub-surface reactions during low temperature aluminium oxide atomic layer deposition on fiber-forming polymers Spagnola, Joseph C.; Gong, Bo; Arvidson, Sara A. Journal of Materials Chemistry, Vol. 20, Issue 20 https://doi.org/10.1039/c0jm00355g	journal	January 2010
Application of Plasmask R resist and the DESIRE process to lithography at 248 nm Hutton, Richard S. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 8, Issue 6 https://doi.org/10.1116/1.585105	journal	November 1990
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Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm Fabrication Schvartzman, Mark; Wind, Shalom J. Nano Letters, Vol. 9, Issue 10 https://doi.org/10.1021/nl9018512	journal	October 2009
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Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers Färm, Elina; Kemell, Marianna; Ritala, Mikko The Journal of Physical Chemistry C, Vol. 112, Issue 40 https://doi.org/10.1021/jp803872s	journal	September 2008
Reduction of line edge roughness in the top surface imaging process Mori, Shigeyasu; Morisawa, Taku; Matsuzawa, Nobuyuki Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 16, Issue 6, Article No. 3739 https://doi.org/10.1116/1.590409	journal	November 1998
Increased pattern transfer fidelity of ZEP 520A during reactive ion etching through chemical modifications by additional dosing of the electron beam resist Czaplewski, David A.; Ocola, Leonidas E. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 2 https://doi.org/10.1116/1.3562272	journal	March 2011
A Top Surface Imaging Method Using Area Selective ALD on Chemically Amplified Polymer Photoresist Films Sinha, Ashwini; Hess, Dennis W.; Henderson, Clifford L. Electrochemical and Solid-State Letters, Vol. 9, Issue 11 https://doi.org/10.1149/1.2335939	journal	January 2006
Improved etch resistance of ZEP 520A in reactive ion etching through heat and ultraviolet light treatment Czaplewski, David A.; Tallant, David R.; Patrizi, Gary A. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 2 https://doi.org/10.1116/1.3086721	journal	January 2009
CMOS compatible strategy based on selective atomic layer deposition of a hard mask for transferring block copolymer lithography patterns Gay, G.; Baron, T.; Agraffeil, C. Nanotechnology, Vol. 21, Issue 43 https://doi.org/10.1088/0957-4484/21/43/435301	journal	September 2010
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Title: Enhanced polymeric lithography resists via sequential infiltration synthesis

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