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Title: Enhanced polymeric lithography resists via sequential infiltration synthesis

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC) (United States). Argonne-Northwestern Solar Energy Research Center (ANSER)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1382820
DOE Contract Number:  
SC0001059
Resource Type:
Journal Article
Journal Name:
Journal of Materials Chemistry
Additional Journal Information:
Journal Volume: 21; Journal Issue: 32; Related Information: ANSER partners with Northwestern University (lead); Argonne National Laboratory; University of Chicago; University of Illinois, Urbana-Champaign; Yale University; Journal ID: ISSN 0959-9428
Publisher:
Royal Society of Chemistry
Country of Publication:
United States
Language:
English
Subject:
catalysis (homogeneous), catalysis (heterogeneous), solar (photovoltaic), solar (fuels), photosynthesis (natural and artificial), bio-inspired, hydrogen and fuel cells, electrodes - solar, defects, charge transport, spin dynamics, membrane, materials and chemistry by design, optics, synthesis (novel materials), synthesis (self-assembly)

Citation Formats

Tseng, Yu-Chih, Peng, Qing, Ocola, Leonidas E., Czaplewski, David A., Elam, Jeffrey W., and Darling, Seth B. Enhanced polymeric lithography resists via sequential infiltration synthesis. United States: N. p., 2011. Web. doi:10.1039/C1JM12461G.
Tseng, Yu-Chih, Peng, Qing, Ocola, Leonidas E., Czaplewski, David A., Elam, Jeffrey W., & Darling, Seth B. Enhanced polymeric lithography resists via sequential infiltration synthesis. United States. doi:10.1039/C1JM12461G.
Tseng, Yu-Chih, Peng, Qing, Ocola, Leonidas E., Czaplewski, David A., Elam, Jeffrey W., and Darling, Seth B. Sat . "Enhanced polymeric lithography resists via sequential infiltration synthesis". United States. doi:10.1039/C1JM12461G.
@article{osti_1382820,
title = {Enhanced polymeric lithography resists via sequential infiltration synthesis},
author = {Tseng, Yu-Chih and Peng, Qing and Ocola, Leonidas E. and Czaplewski, David A. and Elam, Jeffrey W. and Darling, Seth B.},
abstractNote = {},
doi = {10.1039/C1JM12461G},
journal = {Journal of Materials Chemistry},
issn = {0959-9428},
number = 32,
volume = 21,
place = {United States},
year = {2011},
month = {1}
}

Works referenced in this record:

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