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Title: Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale

Journal Article · · Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics
DOI:https://doi.org/10.1116/1.3501359· OSTI ID:1381020

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Center for Excitonics (CE)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
DOE Contract Number:
SC0001088
OSTI ID:
1381020
Journal Information:
Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics, Vol. 28, Issue 6; Related Information: CE partners with Massachusetts Institute of Technology (lead); Brookhaven National Laboratory; Harvard University; ISSN 2166-2746
Publisher:
American Vacuum Society/AIP
Country of Publication:
United States
Language:
English

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