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Coexistence of Low Damping and Strong Magnetoelastic Coupling in Epitaxial Spinel Ferrite Thin Films

Journal Article · · Advanced Materials
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  1. Geballe Laboratory for Advanced Materials Stanford University Stanford CA 94305 USA
  2. Materials and Manufacturing Directorate Air Force Research Laboratory WPAFB OH 45433 USA
  3. Department of Electrical Engineering Wright State University Dayton OH 45431 USA
  4. Advanced Light Source Lawrence Berkeley National Laboratory Berkeley CA 94720 USA
  5. College of Science and Engineering Characterization Facility University of Minnesota Minneapolis MN 55455 USA
  6. Department of Physics The Ohio State University Columbus OH 43210 USA
  7. Department of Materials Science and Engineering University of Illinois Urbana IL 61801 USA
  8. Department of Electrical Engineering and Computer Science Oregon State University Corvallis OR 97331 USA
  9. Department of Electrical Engineering Northeastern University Boston MA 02115 USA

Low‐loss magnetization dynamics and strong magnetoelastic coupling are generally mutually exclusive properties due to opposing dependencies on spin–orbit interactions. So far, the lack of low‐damping, magnetostrictive ferrite films has hindered the development of power‐efficient magnetoelectric and acoustic spintronic devices. Here, magnetically soft epitaxial spinel NiZnAl‐ferrite thin films with an unusually low Gilbert damping parameter (<3 × 10 −3 ), as well as strong magnetoelastic coupling evidenced by a giant strain‐induced anisotropy field (≈1 T) and a sizable magnetostriction coefficient (≈10 ppm), are reported. This exceptional combination of low intrinsic damping and substantial magnetostriction arises from the cation chemistry of NiZnAl‐ferrite. At the same time, the coherently strained film structure suppresses extrinsic damping, enables soft magnetic behavior, and generates large easy‐plane magnetoelastic anisotropy. These findings provide a foundation for a new class of low‐loss, magnetoelastic thin film materials that are promising for spin‐mechanical devices.

Sponsoring Organization:
USDOE
Grant/Contract Number:
AC02-05CH11231
OSTI ID:
1380025
Journal Information:
Advanced Materials, Journal Name: Advanced Materials Journal Issue: 34 Vol. 29; ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)Copyright Statement
Country of Publication:
Germany
Language:
English

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