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Title: Aberration compensation in a Skew parametric-resonance ionization cooling channel

Conference ·
 [1];  [1];  [1];  [2];  [3];  [4]
  1. Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
  2. George Washington Univ., Washington, DC (United States); Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
  3. Univ. of California, Riverside, CA (United States)
  4. Muons Inc., Batavia, IL (United States)

Skew Parametric-resonance Ionization Cooling (Skew PIC) represents a novel method for focusing of highly divergent particle beams, as in the final 6D cooling stage of a high-luminosity muon collider. In the muon collider concept, the resultant equilibrium transverse emittances from cooling with Skew PIC are an order of magnitude smaller than in conventional ionization cooling. The concept makes use of coupling of the transverse dynamic behavior, and the linear dynamics are well-behaved with good agreement between analytic solutions and simulation results. Compared to the uncoupled system, coupling of the transverse dynamic behavior purports to reduce the number of multipoles required for aberration compensation while also avoiding unwanted resonances. Aberration compensation is more complicated in the coupled case, especially in the high-luminosity muon collider application where equilibrium angular spreads in the cooling channel are on the order of 200 mrad. We present recent progress on aberration compensation for control of highly divergent muon beams in the coupled correlated optics channel, and a simple cooling model to test the transverse acceptance of the channel.

Research Organization:
Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
AC05-06OR23177; SC0007634
OSTI ID:
1375768
Report Number(s):
JLAB-ACP-17-2472; DOE/OR/23177-4146
Resource Relation:
Conference: IPAC 2017, Copenhagen, Denmark, May 14-19, 2017
Country of Publication:
United States
Language:
English

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