skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching

Journal Article · · Journal of Vacuum Science and Technology B
DOI:https://doi.org/10.1116/1.4991794· OSTI ID:1375484

Sponsoring Organization:
USDOE
Grant/Contract Number:
AC02-06CH11357
OSTI ID:
1375484
Journal Information:
Journal of Vacuum Science and Technology B, Journal Name: Journal of Vacuum Science and Technology B Vol. 35 Journal Issue: 6; ISSN 2166-2746
Publisher:
American Vacuum Society/AIPCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 20 works
Citation information provided by
Web of Science

References (28)

Metal-Assisted Chemical Etching of Silicon: A Review journal September 2010
Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures journal July 2005
Hard x-ray scanning imaging achieved with bonded multilayer Laue lenses journal January 2017
Vertical directionality-controlled metal-assisted chemical etching for ultrahigh aspect ratio nanoscale structures
  • Tiberio, Richard C.; Rooks, Michael J.; Chang, Chieh
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 32, Issue 6 https://doi.org/10.1116/1.4898199
journal November 2014
Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating journal July 2010
Interlaced zone plate optics for hard X-ray imaging in the 10 nm range journal March 2017
Zone-Doubling Technique to Produce Ultrahigh-Resolution X-Ray Optics journal December 2007
New diamond nanofabrication process for hard x-ray zone plates
  • Uhlén, Fredrik; Lindqvist, Sandra; Nilsson, Daniel
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 6 https://doi.org/10.1116/1.3656055
journal November 2011
Silicon nanostructures from electroless electrochemical etching journal February 2005
Demonstration of 12 nm Resolution Fresnel Zone Plate Lens based Soft X-ray Microscopy journal January 2009
Development characteristics of polymethyl methacrylate in alcohol/water mixtures: a lithography and Raman spectroscopy study journal December 2015
Advanced thin film technology for ultrahigh resolution X-ray microscopy journal October 2009
Porosity control in metal-assisted chemical etching of degenerately doped silicon nanowires journal July 2012
Nanofabrication of high aspect ratio 24 nm x-ray zone plates for x-ray imaging applications
  • Feng, Yan; Feser, Michael; Lyon, Alan
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 6 https://doi.org/10.1116/1.2789447
journal January 2007
High-efficiency multilevel zone plates for keV X-rays journal October 1999
Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling journal April 2013
Fabrication of Single-Crystalline Silicon Nanowires by Scratching a Silicon Surface with Catalytic Metal Particles journal February 2006
High aspect ratio silicon etch: A review journal September 2010
Zone plates with high efficiency in high orders of diffraction described by dynamical theory journal October 1997
Multilayer on-chip stacked Fresnel zone plates: Hard x-ray fabrication and soft x-ray simulations
  • Li, Kenan; Wojcik, Michael J.; Ocola, Leonidas E.
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 33, Issue 6 https://doi.org/10.1116/1.4935252
journal November 2015
CASINO V2.42—A Fast and Easy-to-use Modeling Tool for Scanning Electron Microscopy and Microanalysis Users journal January 2007
Coupled wave description of the diffraction by zone plates with high aspect ratios journal May 1992
Dense high aspect ratio hydrogen silsesquioxane nanostructures by 100 keV electron beam lithography journal June 2010
Metal-assisted chemical etching in HF/H2O2 produces porous silicon journal October 2000
Efficient concentration of high-energy x-rays for diffraction-limited imaging resolution journal January 2017
Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics journal June 2014
Fresnel zone plate stacking in the intermediate field for high efficiency focusing in the hard X-ray regime journal January 2014
Ultra-high resolution zone-doubled 
diffractive X-ray optics for the multi-keV regime journal December 2010

Related Subjects