Methods for enhancing P-type doping in III-V semiconductor films
Patent
·
OSTI ID:1373713
Methods of doping a semiconductor film are provided. The methods comprise epitaxially growing the III-V semiconductor film in the presence of a dopant, a surfactant capable of acting as an electron reservoir, and hydrogen, under conditions that promote the formation of a III-V semiconductor film doped with the p-type dopant. In some embodiments of the methods, the epitaxial growth of the doped III-V semiconductor film is initiated at a first hydrogen partial pressure which is increased to a second hydrogen partial pressure during the epitaxial growth process.
- Research Organization:
- University of Utah Research Foundation, Salt Lake City, UT (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG02-04ER46148
- Assignee:
- University of Utah Research Foundation
- Patent Number(s):
- 9,721,810
- Application Number:
- 13/322,403
- OSTI ID:
- 1373713
- Resource Relation:
- Patent File Date: 2011 Oct 28
- Country of Publication:
- United States
- Language:
- English
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