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Title: Substrate noise isolation improvement in a single-well standard CMOS process

Journal Article · · Integration, The VLSI Journal

Sponsoring Organization:
USDOE Office of Nuclear Energy (NE), Nuclear Fuel Cycle and Supply Chain
Grant/Contract Number:
UID/EEA/50008/2013; PEst-OE/EEI/LA0008/2014
OSTI ID:
1359962
Journal Information:
Integration, The VLSI Journal, Journal Name: Integration, The VLSI Journal Vol. 52 Journal Issue: C; ISSN 0167-9260
Publisher:
ElsevierCopyright Statement
Country of Publication:
Netherlands
Language:
English
Citation Metrics:
Cited by: 2 works
Citation information provided by
Web of Science

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