Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols

Avila, Jason R.; DeMarco, Erica J.; Emery, Jonathan D.; Farha, Omar K.; Pellin, Michael J.; Hupp, Joseph T.; Martinson, Alex B.  F.

doi:10.1021/am503008j

Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols

Journal Article · Mon Jul 21 00:00:00 EDT 2014 · ACS Applied Materials and Interfaces

DOI:https://doi.org/10.1021/am503008j· OSTI ID:1357040

Avila, Jason R. ^[1]; DeMarco, Erica J. ^[1]; Emery, Jonathan D. ^[2]; Farha, Omar K. ^[1]; Pellin, Michael J. ^[3]; Hupp, Joseph T. ^[1]; Martinson, Alex B. F. ^[3]

Northwestern Univ., Evanston, IL (United States). Dept. of Chemistry
Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division
Northwestern Univ., Evanston, IL (United States). Dept. of Chemistry; Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division

Through in-situ quartz crystal microbalance (QCM) monitoring we resolve the growth of a self-assembled monolayer (SAM) and subsequent metal oxide deposition with high resolution. Here, we introduce the fitting of mass deposited during each atomic layer deposition (ALD) cycle to an analytical island-growth model that enables quantification of growth inhibition, nucleation density, and the uninhibited ALD growth rate. A long-chain alkanethiol was self-assembled as a monolayer on gold-coated quartz crystals in order to investigate its effectiveness as a barrier to ALD. Compared to solution-loading, vapor-loading is observed to produce a SAM with equal or greater inhibition-ability in minutes vs. days. The metal oxide growth temperature and the choice of precursor also significantly affect the nucleation density, which ranges from 0.001 to 1 sites/nm². Finally, we observe a minimum 100 cycle inhibition of an oxide ALD process, ZnO, under moderately optimized conditions.

View Accepted Manuscript (DOE)

Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

Grant/Contract Number:: AC02-06CH11357; SC0001059

OSTI ID:: 1357040

Alternate ID(s):: OSTI ID: 1168380
OSTI ID: 1386542

Journal Information:: ACS Applied Materials and Interfaces, Journal Name: ACS Applied Materials and Interfaces Journal Issue: 15 Vol. 6; ISSN 1944-8244

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
alkanethiol
analytical methods
atomic layer deposition
in situ
quartz crystal microbalance
self-assembled monolayers

Real-Time Observation of Atomic Layer Deposition Inhibition: Metal Oxide Growth on Self-Assembled Alkanethiols

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References (37)

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