Radiation hardness studies of AMS HV-CMOS 350 nm prototype chip HVStripV1
- Univ. of Oxford, Oxford (United Kingdom); Univ. of Glasgow, Glasgow (United Kingdom)
- Univ. of Liverpool, Liverpool (United Kingdom)
- Univ. of Oxford, Oxford (United Kingdom)
- Univ. of Glasgow, Glasgow (United Kingdom)
- Univ. of Geneva, Geneva (Switzerland)
- European Organization for Nuclear Research (CERN), Geneva (Switzerland)
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Rutherford Appleton Lab., Didcot (United Kingdom)
- Karlsruhe Institute of Technology, Karlsruhe (Germany)
- Univ. of California, Santa Cruz, CA (United States)
- Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany)
- Jozef Stefan Institute, Ljubljana (Slovenia)
- Univ. of New Mexico, Albuquerque, NM (United States)
- Cambridge Univ., Cambridge (United Kingdom)
- Univ. of Oxford, Oxford (United Kingdom); Rutherford Appleton Lab., Didcot (United Kingdom)
- SLAC National Accelerator Lab., Menlo Park, CA (United States); Univ. of Geneva, Geneva (Switzerland)
- Jozef Stefan Institute, Ljubljana (Slovenia); Univ. of Ljubljana, Ljubljana (Slovenia)
- Univ. of Lancaster, Lancaster (United Kingdom)
- Institute of High Energy Physics, Beijing (People's Republic of China)
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Univ. College London, London (United Kingdom)
CMOS active pixel sensors are being investigated for their potential use in the ATLAS inner tracker upgrade at the HL-LHC. The new inner tracker will have to handle a significant increase in luminosity while maintaining a sufficient signal-to-noise ratio and pulse shaping times. This paper focuses on the prototype chip "HVStripV1" (manufactured in the AMS HV-CMOS 350nm process) characterization before and after irradiation up to fluence levels expected for the strip region in the HL-LHC environment. The results indicate an increase of depletion region after irradiation for the same bias voltage by a factor of ≈2.4 and ≈2.8 for two active pixels on the test chip. As a result, there was also a notable increase in noise levels from 85 e– to 386 e– and from 75 e– to 277 e– for the corresponding pixels.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC02-76SF00515
- OSTI ID:
- 1353115
- Journal Information:
- Journal of Instrumentation, Vol. 12, Issue 02; ISSN 1748-0221
- Publisher:
- Institute of Physics (IOP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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