Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall Nanopatterning Using Atomic Layer Deposition

Yao, Li; Oquendo, Luis E.; Schulze, Morgan W.; Lewis III, Ronald M.; Gladfelter, Wayne L.; Hillmyer, Marc A.

doi:10.1021/acsami.5b12785

Title: Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall Nanopatterning Using Atomic Layer Deposition

Journal Article · Tue Mar 08 00:00:00 EST 2016 · ACS Applied Materials and Interfaces

DOI:https://doi.org/10.1021/acsami.5b12785· OSTI ID:1351388

Yao, Li ^[1]; Oquendo, Luis E. ^[1]; Schulze, Morgan W. ^[1]; Lewis III, Ronald M. ^[1]; Gladfelter, Wayne L. ^[1]; Hillmyer, Marc A. ^[1]

Univ. of Minnesota, Minneapolis, MN (United States)

Poly(cyclohexylethylene)-block-poly(lactide) (PCHE–PLA) block polymers were synthesized through a combination of anionic polymerization, heterogeneous catalytic hydrogenation and controlled ring-opening polymerization. Ordered thin films of PCHE–PLA with ultrasmall hexagonally packed cylinders oriented perpendicularly to the substrate surface were prepared by spin-coating and subsequent solvent vapor annealing for use in two distinct templating strategies. In one approach, selective hydrolytic degradation of the PLA domains generated nanoporous PCHE templates with an average pore diameter of 5 ± 1 nm corroborated by atomic force microscopy and grazing incidence small-angle X-ray scattering. Alternatively, sequential infiltration synthesis (SIS) was employed to deposit Al₂O₃ selectively into the PLA domains of PCHE–PLA thin films. A combination of argon ion milling and O2 reactive ion etching (RIE) enabled the replication of the Al₂O₃ nanoarray from the PCHE–PLA template on diverse substrates including silicon and gold with feature diameters less than 10 nm.

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Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)

Sponsoring Organization:: National Science Foundation (NSF); National Institutes of Health (NIH); National Institute of General Medical Sciences (NIGMS); Northwestern University; E.I. DuPont de Nemours & Co.; The Dow Chemical Company; USDOE Office of Science (SC)

Grant/Contract Number:: DMR-1420013; DMR-1332208; 0960140; AC02-06CH11357

OSTI ID:: 1351388

Journal Information:: ACS Applied Materials and Interfaces, Vol. 8, Issue 11; ISSN 1944-8244

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: ENGLISH

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Cited by: 19 works

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Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
block polymer
self-assembly
nanolithography
nanopores
atomic layer deposition
selective infiltration synthesis
solvent vapor annealing