Suppression of magnetostructural transition on GdSiGe thin film after thermal cyclings

Pires, A. L.; Belo, J. H.; Gomes, I. T.; Hadimani, R. L.; Schlagel, D. L.; Lograsso, T. A.; Jiles, D. C.; Lopes, A. M. L.; Araújo, J. P.; Pereira, A. M.

doi:10.1016/j.tsf.2016.09.013

Title: Suppression of magnetostructural transition on GdSiGe thin film after thermal cyclings

Journal Article · Thu Sep 08 00:00:00 EDT 2016 · Thin Solid Films

DOI:https://doi.org/10.1016/j.tsf.2016.09.013· OSTI ID:1347912

Pires, A. L. ^[1]; Belo, J. H. ^[1]; Gomes, I. T. ^[1]; Hadimani, R. L. ^[2]; Schlagel, D. L. ^[3]; Lograsso, T. A. ^[2]; Jiles, D. C. ^[2]; Lopes, A. M. L. ^[1]; Araújo, J. P. ^[1]; Pereira, A. M. ^[1]

Univ. of Porto (Portugal). Inst. of Nanoscience and Nanotechnology
Iowa State Univ., Ames, IA (United States). Dept. of Electrical and Computer Engineering
Ames Lab. and Iowa State Univ., Ames, IA (United States)

The influence of thermal cycling on the microstructure, magnetic phase transition and magnetic entropy change of a Gd₅Si_1.3Ge_2.7 thin film up to 1000 cycles is investigated. The authors found that after 1000 cycles a strong reduction of the crystallographic phase responsible for the magnetostructural transition (Orthorhombic II phase) occurs. We attribute this to the chemical disorder, caused by the large number of expansion/compression cycles that the Orthorhombic II phase undergoes across the magnetostructural transition. The suppression of the magnetostructural transition corresponds to a drastic decrease of the thin film magnetic entropy change. Our results reveal the importance of studying the thermal/magnetic cycles influence on magnetostructural transitions as they can damage a real-life device.

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Research Organization:: Ames Lab., Ames, IA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-07CH11358

OSTI ID:: 1347912

Alternate ID(s):: OSTI ID: 1413530

Report Number(s):: IS-J 9227; PII: S0040609016305211

Journal Information:: Thin Solid Films, Vol. 621, Issue C; ISSN 0040-6090

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 7 works

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