Recent applications of hard x-ray photoelectron spectroscopy

Weiland, Conan; Rumaiz, Abdul K.; Pianetta, Piero; Woicik, Joseph C.

doi:10.1116/1.4946046

Recent applications of hard x-ray photoelectron spectroscopy

Journal Article · Thu May 05 00:00:00 EDT 2016 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/1.4946046· OSTI ID:1340393

Weiland, Conan ^[1]; Rumaiz, Abdul K. ^[2]; Pianetta, Piero ^[3]; Woicik, Joseph C. ^[1]

National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States)
Brookhaven National Lab. (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)
SLAC National Accelerator Lab., Menlo Park, CA (United States)

Recent applications of hard x-ray photoelectron spectroscopy (HAXPES) demonstrate its many capabilities in addition to several of its limitations. Examples are given, including measurement of buried interfaces and materials under in-situ or in-operando conditions, as well as measurements under x-ray standing-wave and resonant excitation. We also present physical considerations that differentiate HAXPES from photoemission measurements utilizing soft and ultraviolet x rays.

Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

Grant/Contract Number:: SC0012704

OSTI ID:: 1340393

Alternate ID(s):: OSTI ID: 1354509
OSTI ID: 22592888

Report Number(s):: BNL--112623-2016-JA

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Journal Issue: 3 Vol. 34; ISSN 0734-2101

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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