Impacts of SiO2 planarization on optical thin film properties and laser damage resistance
Conference
·
OSTI ID:1338167
Abstract not provided
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC52-07NA27344
- OSTI ID:
- 1338167
- Report Number(s):
- LLNL-PROC-713180
- Country of Publication:
- United States
- Language:
- English
Similar Records
Impacts of SiO2 planarization on optical thin film properties and laser damage resistance
Studies of optical properties and damage threshold of thin films for applications as laser debris shields.
Meeting Thin Film Design and Production Challenges for Laser Damage Resistant Optical Coatings at the Sandia Large Optics Coating Operation.
Conference
·
Thu Sep 22 00:00:00 EDT 2016
·
OSTI ID:1331458
Studies of optical properties and damage threshold of thin films for applications as laser debris shields.
Conference
·
Sat Sep 01 00:00:00 EDT 2007
·
OSTI ID:1146821
Meeting Thin Film Design and Production Challenges for Laser Damage Resistant Optical Coatings at the Sandia Large Optics Coating Operation.
Conference
·
Tue Sep 01 00:00:00 EDT 2009
·
OSTI ID:1141979