R&D 100, 2016: Stress-Induced Fabrication

Multimedia · 07 November 2016

OSTI ID:1334662

Fan, Hongyou ^[1]; Brennan, Tom; Wise, Jack; Liu, Sheng; Hickman, Randy

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1. USDOE

Stress-induced fabrication (SIF) uses compressive mechanical stress to create new nanomaterials with lower production costs and enhanced materials performance compared to traditional fabrication routes. Simple, innovative, and with more degrees of freedom than current chemical synthesis methods, SIF uses physical force instead of chemistry applied to form new nanomaterials with precisely controlled structure and tunable properties.

• Research Organization: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
• Sponsoring Organization: USDOE
• OSTI ID: 1334662
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
FABRICATION
MECHANICAL COMPRESSION
NANOMATERIALS
NANOSTRUCTURES
STRESS-INDUCED