Ab initio evidence for nonthermal characteristics in ultrafast laser melting
Journal Article
·
· Physical Review. B
- Chinese Academy of Sciences (CAS), Beijing (China); DOE/OSTI
- Rensselaer Polytechnic Inst., Troy, NY (United States)
- Chinese Academy of Sciences (CAS), Beijing (China); Collaborative Innovation Center of Quantum Matter, Beijing (China)
Laser melting of semiconductors has been observed for almost 40 years; surprisingly, it is not well understood where most theoretical simulations show a laser-induced thermal process. Ab initio nonadiabatic simulations based on real-time time-dependent density functional theory reveal intrinsic nonthermal melting of silicon, at a temperature far below the thermal melting temperature of 1680 K. Both excitation threshold and time evolution of diffraction intensity agree well with experiment. Nonthermal melting is attributed to excitation-induced drastic changes in bonding electron density, and the subsequent decrease in the melting barrier, rather than lattice heating as previously assumed in the two-temperature models.
- Research Organization:
- Rensselaer Polytechnic Inst., Troy, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- Grant/Contract Number:
- SC0002623
- OSTI ID:
- 1535789
- Alternate ID(s):
- OSTI ID: 1333585
- Journal Information:
- Physical Review. B, Journal Name: Physical Review. B Journal Issue: 18 Vol. 94; ISSN 2469-9950
- Publisher:
- American Physical Society (APS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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