Morphology Control of Poly(styrene-block-dimethylsiloxane) by Simple Blending with Trimethylsilylated Silicate Nanoparticles

Kim, Ginam; Swier, Steven; Lee, Hae-Jeong; Wang, Chengqing

doi:10.1021/acs.macromol.6b01350

Morphology Control of Poly(styrene-block-dimethylsiloxane) by Simple Blending with Trimethylsilylated Silicate Nanoparticles

Journal Article · Tue Sep 27 00:00:00 EDT 2016 · Macromolecules

DOI:https://doi.org/10.1021/acs.macromol.6b01350· OSTI ID:1331705

Kim, Ginam ^[1]; Swier, Steven ^[1]; Lee, Hae-Jeong ^[2]; Wang, Chengqing ^[2]

Dow Corning, Midland, MI (United States)
National Inst. of Standards and Technology (NIST), Gaithersburg, MD (United States)

Trimethylsilylated silicate nanoparticle (termed MQ resin, combining M Me₃SiO_1/2 and Q SiO_4/2 units)/poly(styrene-block-polydimethylsiloxane) (PS–PDMS, 31K–15K, polydispersity PD = 1.15, weight-average molecular weight M_w = 45.5K) blends behave similarly to block copolymers with different PS/PDMS ratios. MQ is localized in the PDMS phase virtually extending the volume fraction in the block copolymer. This allows for microdomain morphology control beyond what can be achieved with the starting block copolymer. Synthesizing siloxane-containing block copolymers targeted at certain equilibrium morphologies can be time-consuming and in some cases technically challenging. This work reported here shows that MQ is a robust morphology modifier, not limited by the occurrence of surface segregation and the high diffusion rates typically associated with homopolymer modification, as confirmed by looking at the PDMS/PS–PDMS reference. The convenient and robust structure control MQ nanoparticle modification of PS–PDMS provides could overcome one of the hurdles to adoption of block copolymer lithography.

View Accepted Manuscript (DOE)

Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)

OSTI ID:: 1331705

Journal Information:: Macromolecules, Journal Name: Macromolecules Journal Issue: 19 Vol. 49; ISSN 0024-9297

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: ENGLISH

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