Effects of geometric factors and shear band patterns on notch sensitivity in bulk metallic glasses

Li, Weidong; Bei, Hongbin; Gao, Yanfei

doi:10.1016/j.intermet.2016.09.001

Title: Effects of geometric factors and shear band patterns on notch sensitivity in bulk metallic glasses

Journal Article · Wed Sep 21 00:00:00 EDT 2016 · Intermetallics

DOI:https://doi.org/10.1016/j.intermet.2016.09.001· OSTI ID:1329744

Li, Weidong ^[1]; Bei, Hongbin ^[2]; Gao, Yanfei ^[3]

Univ. of Tennessee, Knoxville, TN (United States). Dept. of Materials Science and Engineering
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division
Univ. of Tennessee, Knoxville, TN (United States). Dept. of Materials Science and Engineering; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division

Our recent experiments in notched bulk metallic glasses have found reduced, or insensitive, or improved strengths, while in many of these cases the ductile strain prior to final failure is enhanced. First, although the inverse notch effect is explained by a shift from shear localization to cavitation failure, it is suggested in this work that the synergistic effect between cohesive fracture at the notched area and shear bands emanating from the notch roots may extend the parametric space for the notch insensitive behavior. Second, the dependence of shear band patterns on notch geometric factors is determined by the Rudnicki-Rice theory and the free-volume-based finite element simulations. Our results suggest conditions for shear band multiplication to take place and for the shear-localization-induced failure to be delayed.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 1329744

Alternate ID(s):: OSTI ID: 1359219

Journal Information:: Intermetallics, Vol. 79, Issue C; ISSN 0966-9795

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 26 works

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