Validation of the Dynamic Recrystallization (DRX) Mechanism for Whisker and Hillock Growth in Thin Films.

Vianco, Paul T.; Neilsen, Michael K.; Rejent, Jerome A.; Grant, Richard P.

doi:10.1007/s11664-015-3779-4

Validation of the Dynamic Recrystallization (DRX) Mechanism for Whisker and Hillock Growth in Thin Films.

Conference · Sat Nov 01 04:00:00 EDT 2014

DOI:https://doi.org/10.1007/s11664-015-3779-4· OSTI ID:1319745

Vianco, Paul T.; Neilsen, Michael K.; Rejent, Jerome A.; Grant, Richard P.

Abstract not provided.

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Research Organization:: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States); Sandia National Laboratories, Kansas City, MO

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

DOE Contract Number:: AC04-94AL85000

OSTI ID:: 1319745

Report Number(s):: SAND2014-19489C; 541011

Country of Publication:: United States

Language:: English

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A full-field crystal plasticity study on how texture and grain structure influences hydrostatic stress in thermally strained β -Sn films Chakraborty, Aritra; Eisenlohr, Philip Journal of Applied Physics, Vol. 124, Issue 2 https://doi.org/10.1063/1.5029933	journal	July 2018

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