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Large area tunnel oxide passivated rear contact n -type Si solar cells with 21.2% efficiency: Large area tunnel oxide passivated rear contact n -type Si solar cells

Journal Article · · Progress in Photovoltaics
DOI:https://doi.org/10.1002/pip.2739· OSTI ID:1293939
 [1];  [2];  [2];  [3];  [2];  [2];  [4]
  1. Georgia Inst. of Technology, Atlanta, GA (United States); Georgia Institute of Technology
  2. Georgia Inst. of Technology, Atlanta, GA (United States)
  3. Suniva Inc., Norcross GA (United States)
  4. Georgia Inst. of Technology, Atlanta, GA (United States); Suniva Inc., Norcross GA (United States)

This paper reports on the implementation of carrier-selective tunnel oxide passivated rear contact for high-efficiency screen-printed large area n-type front junction crystalline Si solar cells. It is shown that the tunnel oxide grown in nitric acid at room temperature (25°C) and capped with n+ polysilicon layer provides excellent rear contact passivation with implied open-circuit voltage iVoc of 714mV and saturation current density J0b of 10.3 fA/cm2 for the back surface field region. The durability of this passivation scheme is also investigated for a back-end high temperature process. In combination with an ion-implanted Al2O3-passivated boron emitter and screen-printed front metal grids, this passivated rear contact enabled 21.2% efficient front junction Si solar cells on 239 cm2 commercial grade n-type Czochralski wafers.

Research Organization:
Georgia Inst. of Technology, Atlanta, GA (United States)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Solar Energy Technologies Office (EE-4S)
DOE Contract Number:
EE0006336
OSTI ID:
1293939
Journal Information:
Progress in Photovoltaics, Journal Name: Progress in Photovoltaics Journal Issue: 6 Vol. 24; ISSN 1062-7995
Publisher:
Wiley
Country of Publication:
United States
Language:
English

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  • Progress in Photovoltaics: Research and Applications, Vol. 23, Issue 5 https://doi.org/10.1002/pip.2479
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