Large area tunnel oxide passivated rear contact n -type Si solar cells with 21.2% efficiency: Large area tunnel oxide passivated rear contact n -type Si solar cells
- Georgia Inst. of Technology, Atlanta, GA (United States); Georgia Institute of Technology
- Georgia Inst. of Technology, Atlanta, GA (United States)
- Suniva Inc., Norcross GA (United States)
- Georgia Inst. of Technology, Atlanta, GA (United States); Suniva Inc., Norcross GA (United States)
This paper reports on the implementation of carrier-selective tunnel oxide passivated rear contact for high-efficiency screen-printed large area n-type front junction crystalline Si solar cells. It is shown that the tunnel oxide grown in nitric acid at room temperature (25°C) and capped with n+ polysilicon layer provides excellent rear contact passivation with implied open-circuit voltage iVoc of 714mV and saturation current density J0b of 10.3 fA/cm2 for the back surface field region. The durability of this passivation scheme is also investigated for a back-end high temperature process. In combination with an ion-implanted Al2O3-passivated boron emitter and screen-printed front metal grids, this passivated rear contact enabled 21.2% efficient front junction Si solar cells on 239 cm2 commercial grade n-type Czochralski wafers.
- Research Organization:
- Georgia Inst. of Technology, Atlanta, GA (United States)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE), Solar Energy Technologies Office (EE-4S)
- DOE Contract Number:
- EE0006336
- OSTI ID:
- 1293939
- Journal Information:
- Progress in Photovoltaics, Journal Name: Progress in Photovoltaics Journal Issue: 6 Vol. 24; ISSN 1062-7995
- Publisher:
- Wiley
- Country of Publication:
- United States
- Language:
- English
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