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Title: Effect of medium range order on pulsed laser crystallization of amorphous germanium thin films

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4953153· OSTI ID:1281671
 [1];  [1];  [1];  [2];  [1];  [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Oregon State Univ., Corvallis, OR (United States)

Sputter deposited amorphous Ge thin films had their nanostructure altered by irradiation with high-energy Ar+ ions. The change in the structure resulted in a reduction in medium range order (MRO) characterized using fluctuation electron microscopy. The pulsed laser crystallization kinetics of the as-deposited versus irradiated materials were investigated using the dynamic transmission electron microscope operated in the multi-frame movie mode. In conclusion, the propagation rate of the crystallization front for the irradiated material was lower; the changes were correlated to the MRO difference and formation of a thin liquid layer during crystallization.

Research Organization:
Lawrence Livermore National Lab., Livermore, CA (United States)
Sponsoring Organization:
USDOE
Grant/Contract Number:
AC52-07NA27344; AC02-05CH11231
OSTI ID:
1281671
Alternate ID(s):
OSTI ID: 1255463
Report Number(s):
LLNL-JRNL-689356
Journal Information:
Applied Physics Letters, Vol. 108, Issue 22; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 10 works
Citation information provided by
Web of Science

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Cited By (3)

High-Speed Electron Microscopy book January 2019
In situ dynamic transmission electron microscopy characterization of liquid-mediated crystallization of amorphous Ge journal September 2019
Si-integrated ultrathin films of phase-pure Y 3 Fe 5 O 12 (YIG) via novel two-step rapid thermal anneal journal March 2017

Figures / Tables (4)