Effect of medium range order on pulsed laser crystallization of amorphous germanium thin films
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Oregon State Univ., Corvallis, OR (United States)
Sputter deposited amorphous Ge thin films had their nanostructure altered by irradiation with high-energy Ar+ ions. The change in the structure resulted in a reduction in medium range order (MRO) characterized using fluctuation electron microscopy. The pulsed laser crystallization kinetics of the as-deposited versus irradiated materials were investigated using the dynamic transmission electron microscope operated in the multi-frame movie mode. In conclusion, the propagation rate of the crystallization front for the irradiated material was lower; the changes were correlated to the MRO difference and formation of a thin liquid layer during crystallization.
- Research Organization:
- Lawrence Livermore National Lab., Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC52-07NA27344; AC02-05CH11231
- OSTI ID:
- 1281671
- Alternate ID(s):
- OSTI ID: 1255463
- Report Number(s):
- LLNL-JRNL-689356
- Journal Information:
- Applied Physics Letters, Vol. 108, Issue 22; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 10 works
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