Skip to main content
OSTI.GOVU.S. Department of Energy Office of Scientific and Technical Information
U.S. Department of Energy
Office of Scientific and Technical Information
 

X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4960203· OSTI ID:1472027
 [1];  [2];  [1];  [1];  [1];  [1]
  1. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  2. Univ. of California, Berkeley, CA (United States)
+ Show Author Affiliations
Here, diffraction gratings are used from micron to nanometer wavelengths as dispersing elements in optical instruments. At shorter wavelengths, crystals can be used as diffracting elements, but due to the 3D nature of the interaction with light are wavelength selective rather than wavelength dispersing. There is an urgent need to extend grating technology into the x-ray domain of wavelengths from 1 to 0.1 nm, but this requires the use of gratings that have a faceted surface in which the facet angles are very small, typically less than 1°. Small facet angles are also required in the extreme ultra-violet and soft x-ray energy ranges in free electron laser applications, in order to reduce power density below a critical damage threshold. In this work, we demonstrate a technique based on anisotropic etching of silicon designed to produce very small angle facets with a high degree of perfection.
Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Grant/Contract Number:
AC02-05CH11231
OSTI ID:
1472027
Alternate ID(s):
OSTI ID: 22594383
OSTI ID: 1275973
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 4 Vol. 109; ISSN APPLAB; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English

References (12)

High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50–1300eV energy region journal May 1998
Orientation-Resolved Chemical Kinetics:  Using Microfabrication to Unravel the Complicated Chemistry of KOH/Si Etching journal February 2002
Gratings with Blaze Angles Down to 0.1° for Photon Energies up to 10 keV
  • Heidemann, K. F.; Nelles, B.; Lenke, R.
  • SYNCHROTRON RADIATION INSTRUMENTATION: Ninth International Conference on Synchrotron Radiation Instrumentation, AIP Conference Proceedings https://doi.org/10.1063/1.2436104
conference January 2007
Optical demultiplexer using a silicon echelette grating journal February 1980
Design of soft x-ray gratings for free electron lasers: from specification to characterization conference May 2013
A plane grating with single-layer coating for the sub-nanometer wavelength range conference August 2005
I N S EARCH OF P ERFECTION : Understanding the Highly Defect-Selective Chemistry of Anisotropic Etching journal October 2003
Wavelength demultiplexer: using echelette gratings on silicon substrate journal January 1985
Fabrication of extreme-ultraviolet blazed gratings by use of direct argon-oxygen ion-beam etching through a rectangular photoresist mask journal January 2008
A 10,000 groove/mm multilayer coated grating for EUV spectroscopy journal January 2011
High-efficiency 5000 lines/mm multilayer-coated blazed grating for extreme ultraviolet wavelengths journal January 2010
Enhancement of diffraction efficiency via higher-order operation of a multilayer blazed grating journal January 2014

Cited By (1)

Large area nanoimprint enables ultra-precise x-ray diffraction gratings journal January 2017

Similar Records

X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching
Journal Article · Mon Jul 25 00:00:00 EDT 2016 · Applied Physics Letters · OSTI ID:22594383

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY