Mask-Patterned Wet Etching of Thin Titanium Liquid/Gas Diffusion Layers for a PEMEC

Conference · Thu Jan 01 00:00:00 EST 2015

OSTI ID:1265673

Mo, Jingke ^[1]; SteenIII, Stuart M ^[1]; Retterer, Scott T ^[2]; Cullen, David A ^[2]; Terekhov, Alexander Y ^[2]; Zhang, Feng-Yuan ^[1]

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1. University of Tennessee Space Institute (UTSI)
2. ORNL

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1265673
• Resource Relation: Conference: 227th ECS Meeting, Chicago, IL, USA, 20150524, 20150528
• Country of Publication: United States
• Language: English