Effect of doping on room temperature carrier escape mechanisms in InAs/GaAs quantum dot p-i-n junction photovoltaic cells
Journal Article
·
· Journal of Applied Physics
- Department of Materials Science and Engineering, University of Delaware, Newark, Delaware 19716, USA
- NanoPower Research Laboratory, Rochester Institute of Technology, Rochester, New York 14623, USA
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 1253224
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Vol. 119 Journal Issue: 19; ISSN 0021-8979
- Publisher:
- American Institute of PhysicsCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 5 works
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