Interfacial engineering of solution-processed Ni nanochain-SiOx (x&lt; 2) cermets towards thermodynamically stable, anti-oxidation solar selective absorbers

Yu, Xiaobai; Wang, Xiaoxin; Zhang, Qinglin; Liu, Jifeng

doi:10.1063/1.4945035

Interfacial engineering of solution-processed Ni nanochain-SiO_x (x< 2) cermets towards thermodynamically stable, anti-oxidation solar selective absorbers

Journal Article · Fri Apr 01 00:00:00 EDT 2016 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4945035· OSTI ID:1249356

Yu, Xiaobai ^[1]; Wang, Xiaoxin ^[2]; Zhang, Qinglin ^[3]; Liu, Jifeng ^[2]

Dartmouth College, Hanover, NH (United States); Dartmouth College
Dartmouth College, Hanover, NH (United States)
Univ. of Kentucky, Lexington, KY (United States)

Here, cermet solar thermal selective absorber coatings are an important component of high-efficiency concentrated solar power (CSP) receivers. The oxidation of the metal nanoparticles in cermet solar absorbers is a great challenge for vacuum-free operation. Recently, we have demonstrated that oxidation is kinetically retarded in solution processed, high-optical-performance Ni nanochain-SiO_x cermet system compared to conventional Ni-Al₂O₃ system when annealed in air at 450–600 °C for several hours. However, for long-term, high-temperature applications in CSP systems, thermodynamically stable antioxidation behavior is highly desirable, which requires new mechanisms beyond kinetically reducing the oxidation rate. Towards this goal, in this paper, we demonstrate that pre-operation annealing of Ni nanochain-SiO_x cermets at 900 °C in N₂ forms the thermodynamically stable orthorhombic phase of NiSi at the Ni/SiO_x interfaces, leading to self-terminated oxidation at 550 °C in air due to this interfacial engineering. In contrast, pre-operation annealing at a lower temperature of 750 °C in N₂ (as conducted in our previous work) cannot achieve interfacial NiSi formation directly, and further annealing in air at 450–600 °C for >4 h only leads to the formation of the less stable (metastable) hexagonal phase of NiSi. Therefore, the high-temperature pre-operation annealing is critical to form the desirable orthorhombic phase of NiSi at Ni/SiO_x interfaces towards thermodynamically stable antioxidation behavior. Remarkably, with this improved interfacial engineering, the oxidation of 80-nm-diameter Ni nanochain-SiO_x saturates after annealing at 550 °C in air for 12 h. Additional annealing at 550 °C in air for as long as 20 h (i.e., 32 h air annealing at >550 °C in total) has almost no further impact on the structural or optical properties of the coatings, the latter being very sensitive to any interfacial changes due to the localized surface plasmon resonances of the metal nanostructures. This phenomenon holds true for Ni nanoparticle diameter down to 40 nm in Ni-SiO_x system, where the optical response remains stable for 53 h at 550 °C in air. The oxidation vs. time curve also shows saturation behavior deviating from the kinetic Deal-Grove oxidation model. These results strongly suggest a promising approach to thermodynamically stable, anti-oxidation Ni/SiO_x cermet absorbers via interfacial engineering.

View Accepted Manuscript (DOE)

Research Organization:: Dartmouth College, Hanover, NH (United States)

Sponsoring Organization:: USDOE Office of Energy Efficiency and Renewable Energy (EERE)

Grant/Contract Number:: EE0007112

OSTI ID:: 1249356

Alternate ID(s):: OSTI ID: 1245034
OSTI ID: 22594561

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 13 Vol. 119; ISSN JAPIAU; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

References (21)

XPS calibration study of thin-film nickel silicides Cao, Yu; Nyborg, Lars; Jelvestam, Urban Surface and Interface Analysis, Vol. 41, Issue 6 https://doi.org/10.1002/sia.3050	journal	June 2009
Thermal oxidation of the silicides CoSi2, CrSi2, NiSi2, PtSi, TiSi2 and ZrSi2 Strydom, W. J.; Lombaard, J. C.; Pretorius, R. Thin Solid Films, Vol. 131, Issue 3-4 https://doi.org/10.1016/0040-6090(85)90142-7	journal	September 1985
Coatings for enhanced photothermal energy collection I. Selective absorbers Lampert, Carl M. Solar Energy Materials, Vol. 1, Issue 5-6 https://doi.org/10.1016/0165-1633(79)90001-7	journal	June 1979
A study of the NiSi to NiSi2 transition in the Ni–Si binary system Julies, B. A.; Knoesen, D.; Pretorius, R. Thin Solid Films, Vol. 347, Issue 1-2 https://doi.org/10.1016/S0040-6090(99)00004-8	journal	June 1999
Silicides and ohmic contacts Gambino, J. P.; Colgan, E. G. Materials Chemistry and Physics, Vol. 52, Issue 2 https://doi.org/10.1016/S0254-0584(98)80014-X	journal	February 1998
Kinetics of NiSi-to-NiSi2 transformation and morphological evolution in nickel silicide thin films on Si(001) Ma, D.; Chi, D.; Loomans, M. Acta Materialia, Vol. 54, Issue 18 https://doi.org/10.1016/j.actamat.2006.06.042	journal	October 2006
Structural and electrical characterization of the nickel silicide films formed at 850°C by rapid thermal annealing of the Ni/Si(100) films Utlu, G.; Artunç, N.; Budak, S. Applied Surface Science, Vol. 256, Issue 16 https://doi.org/10.1016/j.apsusc.2010.03.062	journal	June 2010
Thermal stability study of NiSi and NiSi2 thin films Zhao, F. F.; Zheng, J. Z.; Shen, Z. X. Microelectronic Engineering, Vol. 71, Issue 1 https://doi.org/10.1016/j.mee.2003.08.010	journal	January 2004
Optimizing the formation of nickel silicide Foggiato, John; Yoo, Woo Sik; Ouaknine, Michel Materials Science and Engineering: B, Vol. 114-115 https://doi.org/10.1016/j.mseb.2004.07.033	journal	December 2004
Comparison of Nanoscaled and Bulk NiO Structural and Environmental Characteristics by XRD, XAFS, and XPS Peck, Matthea A.; Langell, Marjorie A. Chemistry of Materials, Vol. 24, Issue 23 https://doi.org/10.1021/cm300739y	journal	November 2012
Size-Resolved Kinetic Measurements of Aluminum Nanoparticle Oxidation with Single Particle Mass Spectrometry Park, K.; Lee, D.; Rai, A. The Journal of Physical Chemistry B, Vol. 109, Issue 15 https://doi.org/10.1021/jp048041v	journal	April 2005
Plasmonics for extreme light concentration and manipulation Schuller, Jon A.; Barnard, Edward S.; Cai, Wenshan Nature Materials, Vol. 9, Issue 3 https://doi.org/10.1038/nmat2630	journal	February 2010
The structures and properties of hydrogen silsesquioxane (HSQ) films produced by thermal curing Yang, Chang-Chung; Chen, Wen-Chang Journal of Materials Chemistry, Vol. 12, Issue 4 https://doi.org/10.1039/b107697n	journal	February 2002
Coexistence of hexagonal and orthorhombic structures in NiSi films containing Pt Dai, J. Y.; Mangelinck, D.; Lahiri, S. K. Applied Physics Letters, Vol. 75, Issue 15 https://doi.org/10.1063/1.124968	journal	October 1999
Optical study of redox process of Ag nanoparticles at high temperature Bi, Huijuan; Cai, Weiping; Kan, Caixia Journal of Applied Physics, Vol. 92, Issue 12 https://doi.org/10.1063/1.1518147	journal	December 2002
Formation of thin films of NiSi: Metastable structure, diffusion mechanisms in intermetallic compounds d’Heurle, F.; Petersson, C. S.; Baglin, J. E. E. Journal of Applied Physics, Vol. 55, Issue 12 https://doi.org/10.1063/1.333021	journal	June 1984
High-performance solution-processed plasmonic Ni nanochain-Al ₂ O ₃ selective solar thermal absorbers Wang, Xiaoxin; Li, Haofeng; Yu, Xiaobai Applied Physics Letters, Vol. 101, Issue 20 https://doi.org/10.1063/1.4766730	journal	November 2012
Influence of surface oxidation on plasmon resonance in monolayer of gold and silver nanoparticles Kuzma, Anton; Weis, Martin; Flickyngerova, Sona Journal of Applied Physics, Vol. 112, Issue 10 https://doi.org/10.1063/1.4767688	journal	November 2012
Oxidation-resistant, solution-processed plasmonic Ni nanochain-SiO _x (x < 2) selective solar thermal absorbers Yu, Xiaobai; Wang, Xiaoxin; Zhang, Qinglin Journal of Applied Physics, Vol. 116, Issue 7 https://doi.org/10.1063/1.4893656	journal	August 2014
Lattice instabilities in hexagonal NiSi: A NiAs prototype structure Connétable, Damien; Thomas, Olivier Physical Review B, Vol. 81, Issue 7 https://doi.org/10.1103/PhysRevB.81.075213	journal	February 2010
In situ real-time studies of nickel silicide phase formation Tinani, M.; Mueller, A.; Gao, Y. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 19, Issue 2 https://doi.org/10.1116/1.1347046	journal	January 2001

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