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Extruder system and method for treatment of a gaseous medium

Patent ·
OSTI ID:1245602
A system for treatment of a gaseous medium, comprises an extruder having a barrel. The extruder further comprises a first inlet port, a second inlet port, and a plurality of outlet ports coupled to the barrel. The first inlet port is configured for feeding a lean sorbent, the second inlet port is configured for feeding a gaseous medium, and the plurality of outlet ports are configured for releasing a plurality of components removed from the gaseous medium. Further, the extruder comprises a plurality of helical elements coupled to a plurality of kneading elements, mounted on a shaft, and disposed within the barrel. The barrel and the plurality of helical and kneading elements together form an absorption unit and a desorption unit. The first and second inlet ports are formed in the absorption unit and the plurality of outlet ports are formed in the absorption and desorption units.
Research Organization:
General Electric Company, Niskayuna, NY (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AR0000084
Assignee:
General Electric Company (Niskayuna, NY)
Patent Number(s):
9,302,220
Application Number:
14/078,815
OSTI ID:
1245602
Country of Publication:
United States
Language:
English

References (2)

Temperature-Induced Uptake of CO 2 and Formation of Carbamates in Mesocaged Silica Modified with n -Propylamines journal June 2010
Aminosilicone Solvents for CO2 Capture journal August 2010

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