Incremental Tuning Up of Fluorous Phenazine Acceptors

Castro, Karlee P.; Clikeman, Tyler T.; DeWeerd, Nicholas J.; Bukovsky, Eric V.; Rippy, Kerry C.; Kuvychko, Igor V.; Hou, Gao-Lei; Chen, Yu-Sheng; Wang, Xue-Bin; Strauss, Steven H.; Boltalina, Olga V.

doi:10.1002/chem.201504122

Incremental Tuning Up of Fluorous Phenazine Acceptors

Journal Article · Mon Mar 14 00:00:00 EDT 2016 · Chemistry - A European Journal (Online)

DOI:https://doi.org/10.1002/chem.201504122· OSTI ID:1242292

Castro, Karlee P.; Clikeman, Tyler T.; DeWeerd, Nicholas J.; Bukovsky, Eric V.; Rippy, Kerry C.; Kuvychko, Igor V.; Hou, Gao-Lei; Chen, Yu-Sheng; Wang, Xue-Bin; Strauss, Steven H.; Boltalina, Olga V. ^[1]

UC

Abstract not provided

Research Organization:: Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)

Sponsoring Organization:: DOE - BASIC ENERGY SCIENCESNSFUNIVERSITY

OSTI ID:: 1242292

Journal Information:: Chemistry - A European Journal (Online), Journal Name: Chemistry - A European Journal (Online) Journal Issue: 12 Vol. 22; ISSN 1521-3765

Publisher:: ChemPubSoc Europe

Country of Publication:: United States

Language:: ENGLISH

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