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Predicted Growth of Two-Dimensional Topological Insulator Thin Films of III-V Compounds on Si(111) Substrate

Journal Article · · Scientific Reports
DOI:https://doi.org/10.1038/srep15463· OSTI ID:1242039
 [1];  [2];  [2];  [2];  [2];  [2];  [2];  [3];  [4]
  1. National Sun Yat-Sen Univ., Kaohsiung (Taiwan); National Sun Yat-Sen University, Taiwan
  2. National Sun Yat-Sen Univ., Kaohsiung (Taiwan)
  3. National Univ. of Singapore (Singapore)
  4. Northeastern Univ., Boston, MA (United States)
We have carried out systematic first-principles electronic structure computations of growth of ultrathin films of compounds of group III (B, Al, In, Ga, and Tl) with group V (N, P, As, Sb, and Bi) elements on Si(111) substrate, including effects of hydrogenation. Two bilayers (BLs) of AlBi, InBi, GaBi, TlAs, and TlSb are found to support a topological phase over a wide range of strains, in addition to BBi, TlN, and TlBi which can be driven into the nontrivial phase via strain. A large band gap of 134 meV is identified in hydrogenated 2 BL film of InBi. One and two BL films of GaBi and 2 BL films of InBi and TlAs on Si(111) surface possess nontrivial phases with a band gap as large as 121 meV in the case of 2 BL film of GaBi. Persistence of the nontrivial phase upon hydrogenations in the III-V thin films suggests that these films are suitable for growing on various substrates.
Research Organization:
Energy Frontier Research Centers (EFRC) (United States). Center for the Computational Design of Functional Layered Materials (CCDM); Northeastern Univ., Boston, MA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Grant/Contract Number:
FG02-07ER46352
OSTI ID:
1242039
Journal Information:
Scientific Reports, Journal Name: Scientific Reports Vol. 5; ISSN 2045-2322
Publisher:
Nature Publishing GroupCopyright Statement
Country of Publication:
United States
Language:
English

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Cited By (14)

Strain induced band inversion and topological phase transition in methyl-decorated stanene film journal December 2017
Controlling the Polarity of the Molecular Beam Epitaxy Grown In-Bi Atomic Film on the Si(111) Surface journal January 2019
Two-dimensional Topological Crystalline Insulator Phase in Sb/Bi Planar Honeycomb with Tunable Dirac Gap journal January 2016
Prediction of Quantum Anomalous Hall Insulator in half-fluorinated GaBi Honeycomb journal August 2016
Topological band-order transition and quantum spin Hall edge engineering in functionalized X-Bi(111) (X = Ga, In, and Tl) bilayer journal September 2016
Prediction of high-temperature Chern insulator with half-metallic edge states in asymmetry-functionalized stanene journal January 2018
Structural and electronic properties of hydrogenated GaBi and InBi honeycomb monolayers with point defects journal January 2018
Robust large gap quantum spin Hall insulators in methyl and ethynyl functionalized TlSb buckled honeycombs journal July 2018
Prediction of two-dimensional organic topological insulator in metal-DCB lattices journal December 2018
Magnetotransport and superconductivity in InBi films grown on Si(111) by molecular beam epitaxy journal September 2019
Electronic transport properties of Weyl semimetals with strain-induced gauge fields journal January 2019
Electronic properties of the two-dimensional (Tl, Rb)/Si(1 1 1)$\boldsymbol{\sqrt3 \times \sqrt3}$ compound having a honeycomb-like structure journal September 2018
Carrier transport in two-dimensional topological insulator nanoribbons in the presence of vacancy defects journal February 2019
Prediction of two-dimensional topological insulator by forming a surface alloy on Au/Si(111) substrate journal January 2016

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