Preferential emission into epsilon-near-zero metamaterial [Invited]
Journal Article
·
· Optical Materials Express
- City College of New York, NY (United States); City Univ. (CUNY), NY (United States); Brookhaven Science Associates, LLC
- City College of New York, NY (United States); City Univ. (CUNY), NY (United States)
- Univ. of Alberta, Edmonton, AB (Canada)
We report the use of epsilon near zero (ENZ) metamaterial to control spontaneous emission from Zinc-Oxide (ZnO) excitons. The ENZ material consists of alternating layers of silver and alumina with subwavelength thicknesses, resulting in an effective medium where one of the components of the dielectric constant approach zero between 370nm-440nm wavelength range. Bulk ZnO with photoluminescence maximum in the ENZ regime was deposited via atomic layer deposition to obtain a smooth film with near field coupling to the ENZ metamaterial. Preferential emission from the ZnO layer into the metamaterial with suppression of forward emission by 90% in comparison to ZnO on silicon is observed. We attribute this observation to the presence of dispersionless plasmonic modes in the ENZ regime as shown by the results of theoretical modeling presented here. Integration of ENZ metamaterials with light emitters is an attractive platform for realizing a low threshold subwavelength laser.
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
- Grant/Contract Number:
- AC02-98CH10886
- OSTI ID:
- 1240644
- Journal Information:
- Optical Materials Express, Journal Name: Optical Materials Express Journal Issue: 12 Vol. 5; ISSN 2159-3930
- Publisher:
- Optical Society of America (OSA)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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