Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics

Journal Article · Sun Oct 01 04:00:00 EDT 1995 · Applied Optics

DOI:https://doi.org/10.1364/AO.34.006389· OSTI ID:122984

Da Silva, L B; Barbee, Jr, T W; Cauble, R; Celliers, P; Ciarlo, D; Moreno, J C; Mrowka, S; Trebes, J E; Wan, A S; Weber, F ^[1]

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1. Lawrence Livermore National Laboratory, M/S L-447, P.O. Box 808, Livermore, California 94550 (United States)

The development of multilayer mirror technology capable of operating in the range of 3--30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach--Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas.

• Research Organization: Los Alamos National Laboratory
• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-36
• OSTI ID: 122984
• Journal Information: Applied Optics, Journal Name: Applied Optics Journal Issue: 28 Vol. 34; ISSN APOPAI; ISSN 0003-6935
• Country of Publication: United States
• Language: English

Related Subjects

44 INSTRUMENTATION
INCLUDING NUCLEAR AND PARTICLE DETECTORS
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
DESIGN
EXTREME ULTRAVIOLET RADIATION
INTERFEROMETERS
LAYERS
MOLYBDENUM
PLASMA DIAGNOSTICS
SILICON
TESTING