External control of electron energy distributions in a dual tandem inductively coupled plasma

Liu, Lei; Sridhar, Shyam; Zhu, Weiye; Donnelly, Vincent M.; Economou, Demetre J.; Logue, Michael D.; Kushner, Mark J.

doi:10.1063/1.4928870

Title: External control of electron energy distributions in a dual tandem inductively coupled plasma

Journal Article · Thu Aug 27 00:00:00 EDT 2015 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4928870· OSTI ID:1229647

^[1]; Sridhar, Shyam ^[1]; Zhu, Weiye ^[1]; Donnelly, Vincent M. ^[1]; Economou, Demetre J. ^[1];

^[2]; Kushner, Mark J. ^[2]

Plasma Processing Laboratory, Department of Chemical and Biomolecular Engineering, University of Houston, Houston, Texas 77204-4004, USA
Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122, USA

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Sponsoring Organization:: USDOE

Grant/Contract Number:: SC0001939

OSTI ID:: 1229647

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Vol. 118 Journal Issue: 8; ISSN 0021-8979

Publisher:: American Institute of PhysicsCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 13 works

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References (22)

Pulsed-power plasma reactors: two-dimensional electropositive discharge simulation in a GEC reference cell Ramamurthi, Badri; Economou, Demetre J. Plasma Sources Science and Technology, Vol. 11, Issue 3 https://doi.org/10.1088/0963-0252/11/3/315	journal	July 2002
Electron energy distribution function and plasma parameters across magnetic filters Aanesland, A.; Bredin, J.; Chabert, P. Applied Physics Letters, Vol. 100, Issue 4 https://doi.org/10.1063/1.3680088	journal	January 2012
Electron‐temperature control for plasmas passing through a negatively biased grid Kato, Kohgi; Iizuka, Satoru; Sato, Noriyoshi Applied Physics Letters, Vol. 65, Issue 7 https://doi.org/10.1063/1.112240	journal	August 1994
Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF ₄ /O ₂ Song, Sang-Heon; Kushner, Mark J. Plasma Sources Science and Technology, Vol. 21, Issue 5 https://doi.org/10.1088/0963-0252/21/5/055028	journal	October 2012
Dynamics of pulsed-power chlorine plasmas Malyshev, M. V.; Donnelly, V. M.; Colonell, J. I. Journal of Applied Physics, Vol. 86, Issue 9 https://doi.org/10.1063/1.371447	journal	November 1999
Experimental study of diffusive cooling of electrons in a pulsed inductively coupled plasma Maresca, Antonio; Orlov, Konstantin; Kortshagen, Uwe Physical Review E, Vol. 65, Issue 5 https://doi.org/10.1103/PhysRevE.65.056405	journal	May 2002
Low‐temperature, uniform, and high‐density plasma produced by a new ultra‐high‐frequency discharge with a spokewise antenna Samukawa, Seiji; Nakagawa, Yukito; Tsukada, Tsutomu Applied Physics Letters, Vol. 67, Issue 10 https://doi.org/10.1063/1.114511	journal	September 1995
Electron temperature control with grid bias in inductively coupled argon plasma Hong, J. I.; Seo, S. H.; Kim, S. S. Physics of Plasmas, Vol. 6, Issue 3 https://doi.org/10.1063/1.873342	journal	March 1999
Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design Kushner, Mark J. Journal of Physics D: Applied Physics, Vol. 42, Issue 19 https://doi.org/10.1088/0022-3727/42/19/194013	journal	September 2009
Electron temperature control by varying size of slits made in a grid Kato, Kohgi; Shimizu, Tetsuji; Iizuka, Satoru Applied Physics Letters, Vol. 76, Issue 5 https://doi.org/10.1063/1.125814	journal	January 2000
Control of ion energy distributions using a pulsed plasma with synchronous bias on a boundary electrode Shin, Hyungjoo; Zhu, Weiye; Xu, Lin Plasma Sources Science and Technology, Vol. 20, Issue 5 https://doi.org/10.1088/0963-0252/20/5/055001	journal	August 2011
Dynamics of inductively-coupled pulsed chlorine plasmas in the presence of continuous substrate bias Malyshev, M. V.; Donnelly, V. M. Plasma Sources Science and Technology, Vol. 9, Issue 3 https://doi.org/10.1088/0963-0252/9/3/314	journal	July 2000
Electron energy distribution functions and the influence on fluorocarbon plasma chemistry Sugai, H.; Ghanashev, I.; Hosokawa, M. Plasma Sources Science and Technology, Vol. 10, Issue 2 https://doi.org/10.1088/0963-0252/10/2/327	journal	May 2001
Electron temperature control by an external magnetic field in solenoidal inductive discharge Lee, Min-Hyong; Ku, Ju-Hwan; Hwang, Kwang-Tae Physics of Plasmas, Vol. 16, Issue 6 https://doi.org/10.1063/1.3130719	journal	June 2009
Electron energy distribution function control in gas discharge plasmas Godyak, V. A. Physics of Plasmas, Vol. 20, Issue 10 https://doi.org/10.1063/1.4823075	journal	October 2013
Plasma molding over surface topography: Energy and angular distribution of ions extracted out of large holes Kim, Chang-Koo; Economou, Demetre J. Journal of Applied Physics, Vol. 91, Issue 5 https://doi.org/10.1063/1.1435423	journal	March 2002
Characterization of pulse-modulated inductively coupled plasmas in argon and chlorine Hebner, G. A.; Fleddermann, C. B. Journal of Applied Physics, Vol. 82, Issue 6 https://doi.org/10.1063/1.366277	journal	September 1997
Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges Shin, Hyungjoo; Zhu, Weiye; Economou, Demetre J. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 3 https://doi.org/10.1116/1.4705515	journal	May 2012
Controlling VUV photon fluxes in low-pressure inductively coupled plasmas Tian, Peng; Kushner, Mark J. Plasma Sources Science and Technology, Vol. 24, Issue 3 https://doi.org/10.1088/0963-0252/24/3/034017	journal	May 2015
Ion energy distributions in inductively coupled plasmas having a biased boundary electrode Logue, Michael D.; Shin, Hyungjoo; Zhu, Weiye Plasma Sources Science and Technology, Vol. 21, Issue 6 https://doi.org/10.1088/0963-0252/21/6/065009	journal	November 2012
Plasma etching: Yesterday, today, and tomorrow Donnelly, Vincent M.; Kornblit, Avinoam Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 31, Issue 5 https://doi.org/10.1116/1.4819316	journal	September 2013
On a dual inductively coupled plasma for direct and remote plasma in a reactor Uhm, Saehoon; Lee, Kyong-Ho; Chang, Hong Young Physics of Plasmas, Vol. 11, Issue 10 https://doi.org/10.1063/1.1789997	journal	October 2004

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