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Rapid thermal processing chamber for in-situ x-ray diffraction

Journal Article · · Review of Scientific Instruments
DOI:https://doi.org/10.1063/1.4904848· OSTI ID:1228461

Not Available

Sponsoring Organization:
USDOE
Grant/Contract Number:
AC02-76SF00515; EE0005951
OSTI ID:
1228461
Alternate ID(s):
OSTI ID: 22392320
Journal Information:
Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 1 Vol. 86; ISSN 0034-6748; ISSN RSINAK
Publisher:
American Institute of PhysicsCopyright Statement
Country of Publication:
United States
Language:
English

References (17)

High-Temperature Contact Formation on n-Type Silicon: Basic Reactions and Contact Model for Seed-Layer Contacts journal February 2010
Formation of CuInSe 2 and CuGaSe 2 Thin-Films Deposited by Three-Stage Thermal Co-Evaporation: A Real-Time X-Ray Diffraction and Fluorescence Study journal June 2013
Formation of metastable Li2Al3Y through rapid solidification processing journal May 1994
Study on phase diagram of Bi2O3SiO2 system for Bridgman growth of Bi4Si3O12 single crystal journal January 2000
Sintering and Contact Formation of Glass Containing Silver Pastes journal January 2012
A new environmental friendly silver front contact paste for crystalline silicon solar cells journal February 2013
Metastable II–VI sulphides: Growth, characterization and stability journal May 2011
Recent developments in metastable dilute-N III–V semiconductors journal January 2003
Physical understanding of printed thick-film front contacts of crystalline Si solar cells—Review of existing models and recent developments journal November 2006
Mechanism for the formation of Ag crystallites in the Ag thick-film contacts of crystalline Si solar cells journal June 2009
Rapid thermal processing in semiconductor technology journal May 1988
Effect of Bismate Frits Under Fast Firing on Reactions Between Ag Electrodes and Si Wafer for Si Solar Cells journal January 2013
A comparison of C54-TiSi 2 formation in blanket and submicron gate structures using in situ x-ray diffraction during rapid thermal annealing journal September 1995
Study of Repeatability, Relative Accuracy and Lifetime of Thermocouple Instrumented Calibration Wafers for RTP journal January 1997
Difference between Wafer Temperature and Thermocouple Reading during rapid Thermal Processing journal January 1998
Iron-Silicate Glassy Films by Sol-Gel Conversion Induced by Rapid Thermal Processing journal January 1998
Non-isothermal crystallization kinetics and phase transformation of Bi2O3-SiO2 glass-ceramics journal January 2011

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