Highly Laminated Soft Magnetic Electroplated CoNiFe Thick Films

Journal Article · Tue Jan 01 04:00:00 EST 2013 · IEEE MAGNETICS LETTERS

DOI:https://doi.org/10.1109/LMAG.2013.2284757· OSTI ID:1211401

Kim, J; Kim, M; Herrault, F; Park, J; Allen, MG

The fabrication and characterization of highly laminated (similar to 40 layers), thick (similar to 40 mu m) films of magnetically soft cobalt-nickel-iron are presented. Thick film fabrication is based on automated sequential electrodeposition of alternating CoNiFe and copper layers, followed by selective copper removal. The film, comprised tens of 1 mu m thick laminations, exhibits saturation flux density of 1.8 T and coercivity of approximately 1.3 Oe. High-frequency film characterization took place in a 36-turn test inductor, which demonstrated constant inductance of 1.6 mu H up to 10 MHz, indicating suppressed eddy-current loss. Quality factor exceeding 40 at 1 MHz, surpassing the performance of similarly fabricated Permalloy (Ni80Fe20) films.

• Sponsoring Organization: USDOE Advanced Research Projects Agency - Energy (ARPA-E)
• DOE Contract Number: AR0000107
• OSTI ID: 1211401
• Journal Information: IEEE MAGNETICS LETTERS, Journal Name: IEEE MAGNETICS LETTERS Vol. 4; ISSN 1949-307X
• Country of Publication: United States
• Language: English