Modification of structure and magnetic anisotropy of epitaxial CoFe₂O₄ films by hydrogen reduction

Chen, Aiping; Poudyal, Narayan; Xiong, Jie; Liu, J. Ping; Jia, Quanxi

doi:10.1063/1.4915504

Modification of structure and magnetic anisotropy of epitaxial CoFe₂O₄ films by hydrogen reduction

Journal Article · Mon Mar 16 00:00:00 EDT 2015 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4915504· OSTI ID:1193448

^[1]; Poudyal, Narayan ^[2]; Xiong, Jie ^[1]; Liu, J. Ping ^[2]; Jia, Quanxi ^[1]

Los Alamos National Lab. (LANL), Los Alamos, NM (United States). Center for Integrated Nanotechnologies (CINT)
Univ. of Texas, Arlington, TX (United States). Dept. of Physics

Heteroepitaxial CoFe₂O₄ (CFO) thin films with different thicknesses were deposited on MgO (001) substrates. The as-deposited CFO films show a clear switching of magnetic anisotropy with increasing film thickness. The thinner films (<100 nm) show a perpendicular magnetic anisotropy due to the out-of-plane compressive strain. The thicker films exhibit an in-plane easy axis owing to the dominating shape anisotropy effect. The magnetostriction coefficient of CFO films is estimated to be λ[001] =-188 × 10⁻⁶. Metallic CoFe₂ films were obtained by annealing the as-deposited CFO films in forming gas (Ar 93% + H₂ 7%) at 450 °C. XRD shows that CoFe₂ films are textured out-of-plane and aligned in-plane, owing to lattice matching between CoFe₂ and MgO substrate. TEM results indicate that as-deposited films are continuous while the annealed films exhibit a nanopore mushroom structure. The magnetic anisotropy of CoFe₂ films is dominated by the shape effect. The results demonstrate that hydrogen reduction can be effectively used to modify microstructures and physical properties of complex metal oxide materials.

View Accepted Manuscript (DOE)

Research Organization:: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: AC52-06NA25396

OSTI ID:: 1193448

Report Number(s):: LA/UR--15-20894

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 11 Vol. 106; ISSN APPLAB; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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