Self-sustained self-sputtering: A possible mechanism for the superdense glow phase of a pseudospark
- Lawrence Berkeley Lab., CA (United States)
- Univ. of Southern California, Los Angeles, CA (United States). Dept. of Physics
- Academy of Science, St. Petersburg (Russian Federation). A.F. Ioffe Physico-Technical Institute
Self-sustained self-sputtering occurring during high current pseudospark operation ({approx}10{sup 4} A/cm{sup 2}, I>10{sup 3} A) is shown to be a possible mechanism for the superdense glow. The mean-free-path for ionization of cathode material sputtered in the low-current hollow-cathode phase can be shorter than the cathode-anode gap distance, and ionized atoms can return to the cathode surface, self-sputtering with a yield greater than one. The self-sputtered cathode atoms become ionized in the beam of electrons accelerated in the cathode sheath. A large fraction of the discharge current at the cathode surface can be carried uniformly over the surface by ions, and a very high electron emission density is not required to maintain the high current.
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 118939
- Journal Information:
- IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 3 Vol. 23; ISSN ITPSBD; ISSN 0093-3813
- Country of Publication:
- United States
- Language:
- English
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