Pseudospark produced pulsed electron beam for material processing
Journal Article
·
· IEEE Transactions on Plasma Science
- Univ. of Erlangen-Nuremberg, Erlangen (Germany). Physics Dept.
An intense pulsed electron beam produced by a pseudospark discharge is used for material processing. The electron beam propagates in a self-focused manner in the background gas. Hardly 12 ns after the beginning of the discharge the fraction of space charge neutralization is about 96%. To sustain the neutralization effect high energy electrons (E <500 keV) are accelerated in radial direction at the beam head, due to strong electric field gradients. At current maximum the beam pinches due to its own magnetic field. At peak current of 400 A and charging voltage up to 16 kV power density reaches 10{sup 9} W/cm{sup 2} on the target surface.
- OSTI ID:
- 118937
- Journal Information:
- IEEE Transactions on Plasma Science, Journal Name: IEEE Transactions on Plasma Science Journal Issue: 3 Vol. 23; ISSN ITPSBD; ISSN 0093-3813
- Country of Publication:
- United States
- Language:
- English
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