Optimization of Long-Range Order in Solvent Vapor Annealed Poly(styrene)-block-poly(lactide) Thin Films for Nanolithography
Journal Article
·
· ACS Applied Materials and Interfaces
- UMM
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
- Sponsoring Organization:
- NSFUNIVERSITY
- OSTI ID:
- 1186897
- Journal Information:
- ACS Applied Materials and Interfaces, Vol. 6, Issue (16) ; 08, 2014; ISSN 1944-8244
- Publisher:
- American Chemical Society
- Country of Publication:
- United States
- Language:
- ENGLISH
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