Fast pulse nonthermal plasma reactor
Patent
·
OSTI ID:1175392
A fast pulsed nonthermal plasma reactor includes a discharge cell and a charging assembly electrically connected thereto. The charging assembly provides plural high voltage pulses to the discharge cell. Each pulse has a rise time between one and ten nanoseconds and a duration of three to twenty nanoseconds. The pulses create nonthermal plasma discharge within the discharge cell. Accordingly, the nonthermal plasma discharge can be used to remove pollutants from gases or break the gases into smaller molecules so that they can be more efficiently combusted.
- Research Organization:
- The Regents of the University of California, Oakland, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-36
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Number(s):
- 6,906,280
- Application Number:
- 10/395,047
- OSTI ID:
- 1175392
- Country of Publication:
- United States
- Language:
- English
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