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Title: Fast pulse nonthermal plasma reactor

Patent ·
OSTI ID:1175392

A fast pulsed nonthermal plasma reactor includes a discharge cell and a charging assembly electrically connected thereto. The charging assembly provides plural high voltage pulses to the discharge cell. Each pulse has a rise time between one and ten nanoseconds and a duration of three to twenty nanoseconds. The pulses create nonthermal plasma discharge within the discharge cell. Accordingly, the nonthermal plasma discharge can be used to remove pollutants from gases or break the gases into smaller molecules so that they can be more efficiently combusted.

Research Organization:
Univ. of California, Oakland, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-36
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Number(s):
6,906,280
Application Number:
10/395,047
OSTI ID:
1175392
Country of Publication:
United States
Language:
English