Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces
Patent
·
OSTI ID:1175219
The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632.8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.
- Research Organization:
- Sandia National Laboratories (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- EUV, LLC (Santa Clara, CA)
- Patent Number(s):
- 6,847,463
- Application Number:
- 10/163,477
- OSTI ID:
- 1175219
- Country of Publication:
- United States
- Language:
- English
Similar Records
Multilayer reflective coatings for extreme-ultraviolet lithography
Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography applications
Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
Conference
·
Mon Mar 09 23:00:00 EST 1998
·
OSTI ID:310916
Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme ultraviolet lithography applications
Conference
·
Thu Feb 19 23:00:00 EST 1998
·
OSTI ID:665028
Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
Conference
·
Thu Aug 05 00:00:00 EDT 1999
·
OSTI ID:12565