Focused electron and ion beam systems

Patent · Tue Jul 27 04:00:00 EDT 2004

OSTI ID:1174962

Leung, Ka-Ngo; Reijonen, Jani; Persaud, Arun; Ji, Qing; Jiang, Ximan

An electron beam system is based on a plasma generator in a plasma ion source with an accelerator column. The electrons are extracted from a plasma cathode in a plasma ion source, e.g. a multicusp plasma ion source. The beam can be scanned in both the x and y directions, and the system can be operated with multiple beamlets. A compact focused ion or electron beam system has a plasma ion source and an all-electrostatic beam acceleration and focusing column. The ion source is a small chamber with the plasma produced by radio-frequency (RF) induction discharge. The RF antenna is wound outside the chamber and connected to an RF supply. Ions or electrons can be extracted from the source. A multi-beam system has several sources of different species and an electron beam source.

• Research Organization: The Regents of the University of California, Oakland, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC03-76SF00098
• Assignee: University Of California, The Regents Of
• Patent Number(s): 6,768,120
• Application Number: 10/232,502
• OSTI ID: 1174962
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY