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Title: Npn double heterostructure bipolar transistor with ingaasn base region

Patent ·
OSTI ID:1174958

An NPN double heterostructure bipolar transistor (DHBT) is disclosed with a base region comprising a layer of p-type-doped indium gallium arsenide nitride (InGaAsN) sandwiched between n-type-doped collector and emitter regions. The use of InGaAsN for the base region lowers the transistor turn-on voltage, V.sub.on, thereby reducing power dissipation within the device. The NPN transistor, which has applications for forming low-power electronic circuitry, is formed on a gallium arsenide (GaAs) substrate and can be fabricated at commercial GaAs foundries. Methods for fabricating the NPN transistor are also disclosed.

Research Organization:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Number(s):
6,765,242
Application Number:
09/547,152
OSTI ID:
1174958
Country of Publication:
United States
Language:
English

References (4)

Annealing behavior of p -type Ga0.892In0.108NxAs1−x (0⩽X⩽0.024) grown by gas-source molecular beam epitaxy journal September 1999
Metal-sulfur-based air-stable passivation of GaAs with very low surface-state densities journal January 2000
GaInNAs: A Novel Material for Long-Wavelength-Range Laser Diodes with Excellent High-Temperature Performance journal February 1996
DC characteristics of MOVPE-grown Npn InGaP/InGaAsN DHBTs journal January 2000

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