Method for improving the stability of amorphous silicon
Patent
·
OSTI ID:1174791
A method of producing a metastable degradation resistant amorphous hydrogenated silicon film is provided, which comprises the steps of growing a hydrogenated amorphous silicon film, the film having an exposed surface, illuminating the surface using an essentially blue or ultraviolet light to form high densities of a light induced defect near the surface, and etching the surface to remove the defect.
- Research Organization:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC36-99GO10337
- Assignee:
- Midwest Research Institute (Kansas City, MO)
- Patent Number(s):
- 6,713,400
- Application Number:
- 09/714,331
- OSTI ID:
- 1174791
- Country of Publication:
- United States
- Language:
- English
Hydrogen collision model of light-induced metastability in hydrogenated amorphous silicon
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journal | February 1998 |
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