EUV scatterometry-based measurement method for the determination of phase roughness
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 1164381
- Report Number(s):
- LBNL-6516E
- Journal Information:
- Proc. SPIE, Vol. 8880; Related Information: Journal Publication Date: Sept. 2013
- Country of Publication:
- United States
- Language:
- English
Similar Records
Recovering effective amplitude and phase roughness of EUV masks
Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology
EUV pattern defect detection sensitivity based on aerial image linewidth measurements
Journal Article
·
Mon Sep 02 00:00:00 EDT 2013
· Proc. SPIE
·
OSTI ID:1164381
+3 more
Measurement of EUV lithography pupil amplitude and phase variation via image-based methodology
Journal Article
·
Fri Apr 01 00:00:00 EDT 2016
· Journal of Micro/Nanolithography, MEMS, and MOEMS
·
OSTI ID:1164381
+5 more
EUV pattern defect detection sensitivity based on aerial image linewidth measurements
Journal Article
·
Fri Feb 12 00:00:00 EST 2010
· JVST B
·
OSTI ID:1164381
+3 more