skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Method to create gradient index in a polymer

Abstract

Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of .DELTA.n.gtoreq.1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.

Inventors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1159969
Patent Number(s):
8,859,190
Application Number:
14/018,058
Assignee:
Sandia Corporation (Albuquerque, NM) SNL-A
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Patent File Date: 2013 Sep 04
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Dirk, Shawn M, Johnson, Ross Stefan, Boye, Robert, Descour, Michael R, Sweatt, William C, Wheeler, David R, and Kaehr, Bryan James. Method to create gradient index in a polymer. United States: N. p., 2014. Web.
Dirk, Shawn M, Johnson, Ross Stefan, Boye, Robert, Descour, Michael R, Sweatt, William C, Wheeler, David R, & Kaehr, Bryan James. Method to create gradient index in a polymer. United States.
Dirk, Shawn M, Johnson, Ross Stefan, Boye, Robert, Descour, Michael R, Sweatt, William C, Wheeler, David R, and Kaehr, Bryan James. Tue . "Method to create gradient index in a polymer". United States. https://www.osti.gov/servlets/purl/1159969.
@article{osti_1159969,
title = {Method to create gradient index in a polymer},
author = {Dirk, Shawn M and Johnson, Ross Stefan and Boye, Robert and Descour, Michael R and Sweatt, William C and Wheeler, David R and Kaehr, Bryan James},
abstractNote = {Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of .DELTA.n.gtoreq.1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {10}
}

Patent:

Save / Share:

Works referenced in this record:

Study of thermal conversion and patterning of a new soluble poly (p-phenylenevinylene) (PPV) precursor
journal, April 2007

  • Prelipceanu, Marius; Prelipceanu, Otilia-Sanda; Tudose, Ovidiu-Gelu
  • Materials Science in Semiconductor Processing, Vol. 10, Issue 2-3, p. 77-89
  • DOI: 10.1016/j.mssp.2007.05.004