Method to create gradient index in a polymer

Dirk, Shawn M; Johnson, Ross Stefan; Boye, Robert; Descour, Michael R; Sweatt, William C; Wheeler, David R; Kaehr, Bryan James

Title: Method to create gradient index in a polymer

Patent · Tue Oct 14 00:00:00 EDT 2014

OSTI ID:1159969

Dirk, Shawn M; Johnson, Ross Stefan; Boye, Robert; Descour, Michael R; Sweatt, William C; Wheeler, David R; Kaehr, Bryan James

Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of .DELTA.n.gtoreq.1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.

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Research Organization:: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC04-94AL85000

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Number(s):: 8,859,190

Application Number:: 14/018,058

OSTI ID:: 1159969

Resource Relation:: Patent File Date: 2013 Sep 04

Country of Publication:: United States

Language:: English

References (9)

Patterning of semiconductive polymers Holmes, Andrew Bruce; Bradley, Donal; Friend, Richard Henry https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/5328809 US Patent Document 5,328,809	patent	July 1994
Laser interferometric lithographic system providing automatic change of fringe spacing Ghosh, Amalkumar P.; Schwartz Jones, Susan K.; Jones, Gary W. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/5771098 US Patent Document 5,771,098	patent	June 1998
Weak-link capacitor Dirk, Shawn M.; Johnson, Ross S.; Wheeler, David R. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7955945 US Patent Document 7,955,945	patent	June 2011
Weak-link capacitor Dirk, Shawn M.; Johnson, Ross S.; Wheeler, David R. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/8426321 US Patent Document 8,426,321	patent	April 2013
Deformation-based contact lithography systems, apparatus and methods Stewart, Duncan R.; Walmsley, Robert; Hartwell, Peter G. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20080090155 US Patent Application 11/548975; 20080090155	patent-application	April 2008
Thermal writing using a heated atomic force microscope tip Mamin, H. J. Applied Physics Letters, Vol. 69, Issue 3 https://doi.org/10.1063/1.118085	journal	July 1996
Photopatterning poly(p-phenylenevinylene) from xanthate precursor polymers Johnson, Ross S.; Finnegan, Patrick S.; Wheeler, David R. Chemical Communications, Vol. 47, Issue 13 https://doi.org/10.1039/C1CC00090J	journal	January 2011
Study of thermal conversion and patterning of a new soluble poly (p-phenylenevinylene) (PPV) precursor Prelipceanu, Marius; Prelipceanu, Otilia-Sanda; Tudose, Ovidiu-Gelu Materials Science in Semiconductor Processing, Vol. 10, Issue 2-3, p. 77-89 https://doi.org/10.1016/j.mssp.2007.05.004	journal	April 2007
All-Polymer Optoelectronic Devices Ho, P. K. Science, Vol. 285, Issue 5425 https://doi.org/10.1126/science.285.5425.233	journal	July 1999

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