Dynamic tuning of chemiresistor sensitivity using mechanical strain
Patent
·
OSTI ID:1159929
The sensitivity of a chemiresistor sensor can be dynamically tuned using mechanical strain. The increase in sensitivity is a smooth, continuous function of the applied strain, and the effect can be reversible. Sensitivity tuning enables the response curve of the sensor to be dynamically optimized for sensing analytes, such as volatile organic compounds, over a wide concentration range.
- Research Organization:
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 8,846,406
- Application Number:
- 13/353,941
- OSTI ID:
- 1159929
- Country of Publication:
- United States
- Language:
- English
Controlling percolation in field-structured particle composites: Observations of giant thermoresistance, piezoresistance, and chemiresistance
|
journal | March 2003 |
Similar Records
Multi-pin chemiresistors for microchemical sensors
Field-structured chemiresistors : tunable sensors for chemical-switch arrays.
Chemiresistor urea sensor
Patent
·
Mon Feb 19 23:00:00 EST 2007
·
OSTI ID:902701
Field-structured chemiresistors : tunable sensors for chemical-switch arrays.
Conference
·
Sun Aug 01 00:00:00 EDT 2010
·
OSTI ID:1022218
Chemiresistor urea sensor
Patent
·
Mon Dec 15 23:00:00 EST 1997
·
OSTI ID:563679