Dynamic tuning of chemiresistor sensitivity using mechanical strain
Patent
·
OSTI ID:1159929
The sensitivity of a chemiresistor sensor can be dynamically tuned using mechanical strain. The increase in sensitivity is a smooth, continuous function of the applied strain, and the effect can be reversible. Sensitivity tuning enables the response curve of the sensor to be dynamically optimized for sensing analytes, such as volatile organic compounds, over a wide concentration range.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 8,846,406
- Application Number:
- 13/353,941
- OSTI ID:
- 1159929
- Country of Publication:
- United States
- Language:
- English
Chemiresistor for Use in Conducting Electrolyte Solution
|
patent-application | November 2010 |
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