Slurry particle size evolution during the polishing of optical glass
- Institute of Optics and the Laboratory for Laser Energetics, University of Rochester, Rochester, New York 14627 (United States)
- Brookhaven Instruments Corporation, Holtsville, New York 11742 (United States)
The particle size distribution of aqueous metal-oxide slurries can evolve during the polishing of optical glass in response to changes in mechanical and chemical process factors. The size-evolution phenomenon and its consequences were systematically studied in a planar continuous-polishing process. The concurrent application of electrokinetic techniques to characterize common optical shop materials has contributed new insight into the nature of silicate glass polishing by demonstrating the pivotal role of fluid chemistry, particularly pH, in maintaining electrokinetically favorable conditions for a well-dispersed polishing agent. According to the proposed slurry-charge-control effect, a well-dispersed polishing agent is the key to obtaining the smoothest possible glass surfaces, especially when a recirculated slurry is used.
- Research Organization:
- Univ. of Rochester, NY (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FC03-92SF19460
- OSTI ID:
- 115789
- Journal Information:
- Applied Optics, Vol. 34, Issue 19; Other Information: PBD: 1 Jul 1995
- Country of Publication:
- United States
- Language:
- English
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