Reduction in thermal boundary conductance due to proton implantation in silicon and sapphire.
- Sandia National Laboratories, Livermore, CA
Abstract not provided.
- Research Organization:
- Sandia National Laboratories Livermore, CA; Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 1108230
- Report Number(s):
- SAND2011-2866J; 470341
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 23 Vol. 98; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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