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Molecular Scale Modeling of Polymer Imprint Nanolithography.

Journal Article · · Langmuir
OSTI ID:1106513

Abstract not provided.

Research Organization:
Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
1106513
Report Number(s):
SAND2011-7611J; 464924
Journal Information:
Langmuir, Journal Name: Langmuir
Country of Publication:
United States
Language:
English

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