Evolution of Stress Gradients in Cu Films and Features Induced by Capping Layers
Journal Article
·
· Microelectron. Eng 92:95,2012
OSTI ID:1095056
- Research Organization:
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- AC02-76SF00515
- OSTI ID:
- 1095056
- Report Number(s):
- SLAC-REPRINT-2013-798
- Journal Information:
- Microelectron. Eng 92:95,2012, Journal Name: Microelectron. Eng 92:95,2012
- Country of Publication:
- United States
- Language:
- English
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